CleWin

CleWin

Is used worldwide in 25 countries, both by companies and universities
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CleWin is a layout editor we designed in cooperation with the MESA Research Institute at the University of Twente and Deltamask, a mask making company.
Since we started with the development of CleWin, almost 15 years ago, the product has evolved from a simple editor to a powerful mask design tool.

The product has been very successful over the years and is used worldwide in 25 countries, both by companies and universities.

Because CleWin is also meant to be used by students a lot of attention is given to the user interface.

CleWin is a hierarchical layout editor, i.e. a layout consists of symbols (also called cells) which may be nested.

Editing a symbol in one place will change all other instances of the same symbol.

CleWin shows a hierarchical list of all symbols in a design, so that each symbol definition is directly accessible for editing.
Furthermore, the hierarchical list provides a clear overview of the file structure and the dependencies between the defined symbols.
In this version , a powerful scripting engine was added, that allows the generation of objects using four different languages: C, Matlab, the MaskEngineer language and Lua.
Scripts are especially useful for complex, parametric designs, but also for relatively simple tasks like automatic numbering of chips.

The most important features of CleWin include:
-Hierarchical tree-view of the design giving direct access to every symbol definition.
-Improved polygon and wire editing, allowing adding and deleting nodes by simple mouse clicks.
-Full support of true-type fonts.
-Advanced grid with the possibility of using a different grid spacing in the horizontal and vertical direction.
-Snap to grid, guidelines and/or 45 degree angles.
-Any CIF or GDS-II file can be used as symbol library.
-Powerful scripting possibilities in C, MatLab (requires a separate MatLab license), MaskEngineer and Lua.
-Built-in area calculator and cross-section viewer
-Unlimited undo function.
-1 nanometer resolution.

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